Glossary entry (derived from question below)
Japanese term or phrase:
フィールド酸化膜
English translation:
field oxide (film/layer)
Added to glossary by
David Higbee
Nov 17, 2006 05:46
17 yrs ago
Japanese term
United States
Fast, accurate, highest quality
Native in: English 
, Spanish
Works in: Japanese to English, English to Japanese, Japanese to Spanish, and 4 more.
フィールド酸化膜
Japanese to English
Tech/Engineering
Patents
Ｆｒｏｍ ａ ｐａｔｅｎｔ ｈａｖｉｎｇ ｔｏ ｄｏ ｗｉｔｈ ｃｈｅｍｉｃａｌ ｅｔｃｈｉｎｇ
Proposed translations
(English)
| 2 +3 | field oxide (film/layer) |
KathyT
|
| 5 +2 | field oxide |
Norihito Hamaguchi
|
| 4 +2 | Field Oxide |
TimG
|
Proposed translations
+3
9 mins
Selected
field oxide (film/layer)
From Glova:
フィールド酸化膜 field oxide
フィールド酸化膜 | 電界酸化物 field oxide
[PDF]
Realization of silicon quantum wires by selective chemical etching ...
File Format: PDF/Adobe Acrobat
fabricated by using a selective chemical etching technique ... the planar field oxide thickness on a flat surface and the. silicon wire oxide thickness as a ...
www.springerlink.com/index/M8DMMM315GLBNNCR.pdf -
High hole mobility in SiGe channel metal–oxide–semiconductor field ...
Then was deposited as a field oxide. In the active transistor areas the field oxide was removed by wet chemical etching. After a cleaning step the gate ...
link.aip.org/link/?apl/76/3920 -
MOSFET Circuits and Technology
The field oxide was replaced by a local oxidation isolation structure ... The high etch rate selectivity of wet chemical etching is not obtained with these ...
ece-www.colorado.edu/~bart/book/book/chapter7/ch7_6.htm
フィールド酸化膜 field oxide
フィールド酸化膜 | 電界酸化物 field oxide
[PDF]
Realization of silicon quantum wires by selective chemical etching ...
File Format: PDF/Adobe Acrobat
fabricated by using a selective chemical etching technique ... the planar field oxide thickness on a flat surface and the. silicon wire oxide thickness as a ...
www.springerlink.com/index/M8DMMM315GLBNNCR.pdf -
High hole mobility in SiGe channel metal–oxide–semiconductor field ...
Then was deposited as a field oxide. In the active transistor areas the field oxide was removed by wet chemical etching. After a cleaning step the gate ...
link.aip.org/link/?apl/76/3920 -
MOSFET Circuits and Technology
The field oxide was replaced by a local oxidation isolation structure ... The high etch rate selectivity of wet chemical etching is not obtained with these ...
ece-www.colorado.edu/~bart/book/book/chapter7/ch7_6.htm
Reference:
4 KudoZ points awarded for this answer.
Comment: "Thanks for the references"
+2
10 mins
Field Oxide
Also known as FOX.
Second link is a little difficult to wade through. Skip to page 4 if I remember correctly.
Second link is a little difficult to wade through. Skip to page 4 if I remember correctly.
+2
41 mins
Norihito Hamaguchi
United States
United States
Native in Japanese
Specializes in field
United States
Specializing in Semiconductors
Native in: Japanese
Works in: English to Japanese, Japanese to English
Related KudoZ points
:
3
field oxide
In silicon ICs thick oxide (silicon dioxide, SiO2) used to electrically isolate each MOSFET device is called field oxide in order to distinguish it from the gate oxide, which separate the gate from the channel.
Example sentence:
A thick field oxide (layer) was grown by wet oxidation.
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